J. Phys. Theor. Appl.
Volume 2, Numéro 1, 1903
Page(s) 36 - 40
J. Phys. Theor. Appl. 2, 36-40 (1903)
DOI: 10.1051/jphystap:01903002003601

Préparation de lames minces métalliques par projection cathodique

L. Houllevigue

Without abstract

8115C - Deposition by sputtering.

Key words
Experimental study -- Cathode sputtering -- Thin film -- Crystal growth from vapors

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